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Tantalum Targets
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TANTALUM TARGET: applicable to the field of semiconductor and optical filming


Purity:
:Ta≥99.95%~99.99%


Specification: as per customer’s requirements


Other technical requirements: grain size ≤
100μm; flatness 0.2mm, surface fineness1.6μm




brand

 CHEMICAL COMPOSITION OF TANTALUM 

 

 

 

C

N

O

H

Fe

Mo

Nb

Ni

Si

Ti

W

Ta

RO5200

0.01

0.01

0.015

0.0015

0.01

0.02

0.1

0.01

0.005

0.01

0.05

Allowance

RO5252

0.01

0.01

0.015

0.0015

0.01

0.5

0.5

0.01

0.005

0.01

2.0~3.5

Allowance

Ta1

0.01

0.005

0.015

0.002

0.005

0.05

0.05

0.002

0.005

0.002

0.01

Allowance

Ta2

0.02

0.025

0.03

0.005

0.03

0.02

0.1

0.005

0.02

0.005

0.04

Allowance

Upon customer’s requirements, we can manufacture tantalum products with quality above standards in force.



Company address: 15 Leyuan Street, Yanxi Development Area, Huairou District, Beijing, CHINA 101407  

Tel (Fax):0086-10-64364175, 64373181, 64347751, 84936860  E-Mail: market@bjhycx.com

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