TANTALUM TARGET: applicable to the
field of semiconductor and optical filming
Purity:：Ta≥99.95%~99.99%
Specification: as per customer’s requirements
Other technical requirements:
grain size ≤100μm; flatness ≤0.2mm, surface fineness≤1.6μm
|
brand |
CHEMICAL COMPOSITION OF TANTALUM |
|
|
|
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|
C |
N |
O |
H |
Fe |
Mo |
Nb |
Ni |
Si |
Ti |
W |
Ta |
|
|
RO5200 |
0.01 |
0.01 |
0.015 |
0.0015 |
0.01 |
0.02 |
0.1 |
0.01 |
0.005 |
0.01 |
0.05 |
Allowance |
|
RO5252 |
0.01 |
0.01 |
0.015 |
0.0015 |
0.01 |
0.5 |
0.5 |
0.01 |
0.005 |
0.01 |
2.0~3.5 |
Allowance |
|
Ta1 |
0.01 |
0.005 |
0.015 |
0.002 |
0.005 |
0.05 |
0.05 |
0.002 |
0.005 |
0.002 |
0.01 |
Allowance |
|
Ta2 |
0.02 |
0.025 |
0.03 |
0.005 |
0.03 |
0.02 |
0.1 |
0.005 |
0.02 |
0.005 |
0.04 |
Allowance |
|
Upon customer’s requirements, we can manufacture tantalum products with quality above standards in force. |
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Company address: 15 Leyuan Street, Yanxi Development Area, Huairou District, Beijing, CHINA 101407
